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The XP-2 is a stylus type surface profilometer and as such is intended for very high (Z) resolution measurements of surface topography on a wide variety of samples. The XP-2 uses a diamond stylus to lightly contact the surface. The sample stage is moved under the contacting stylus while the height displacement is measured using a laser beam bounce method. |
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Sample Stage Diameter |
200mm |
Sample Thickness |
300mm maximun |
Scan Length Range |
50mm maximum |
X-Y Stage Translation |
150mm X 178mm |
Stage Positioning |
Motorized and programmable |
Vertical Range |
400 µ m maximum |
Vertical Resolution |
1Å at 10 µ m, 15Å at 100 µ m, 62Å at 400 µ m |
Max. Data Points per Scan |
60,000 |
Sample Viewing |
Color Camera |
Magnification |
40-160X motorized zoom |
Field of View |
1-4mm |
Stylus Tip Radius |
2.0 microns |
Stylus Force Range |
.05-10mg (programmable) |
Computer System |
Intel microprocessor with Windows XP |
Scan Filtering |
Low-pass, high-pass, band-pass, and adjustable filter |
Stress Software |
Standard |
Vacuum Chuck |
Standard |
Step Height Repeatability |
10Å, or 0.1% of nominal step; whichever is greater |
Standard Analytical Software |
Roughness Parameters |
Ra, Rq, Rp, Rv, Rt, Rz |
Waviness Parameters |
Wa, Wq, Wp, Wv, Wt, Wz |
Step Height Parameters |
Avg. Step Ht., Avg. Ht., Max. Peak, Max. Valley, Peak to Valley |
Geometry Parameters |
Area, Slope Radius, Perimeter |
Other Parameters |
Stress analysis, height histogram, skewness, profile subtraction |
Automation |
Scan stitching, step detection, auto level, auto measure |
Scan Filtering |
Low-pass, high-pass, band-pass, and adjustable filter |
Ambios Technology Reference Standard |
1 micron nominal step height |
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Laboratorio de Recubrimientos Duros y Aplicaciones Industriales
Edificio 349, espacio 1003, Ciudad Universitaria- Meléndez
Teléfonos +57 (2) 3212122-3152091. Fax 3212122, Email: rdai@univalle.edu.co
Universidad del Valle, Cali, Colombia, ©2009
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Powered-By:Gustavo Holguin-© |
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